0200-40031 — Focus Ring, 300mm Silicon (DPS Etch) (Applied Materials)

Name: 0200-40031 — Focus Ring, 300mm Silicon (DPS Etch) (Applied Materials)
Brand: Applied Materials
SKU: 0200-40031

Part No. 0200-40031

Market Price

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Available by Request

Last verified: 2026-05-16

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✓Tested & inspected

✓Documentation included

✓Fast worldwide shipping

✓30-day functional warranty

✓Escrow payment available

Pricing

Price on request — quote in 4 hours

Market pricing for 0200-40031 — Focus Ring, 300mm Silicon (DPS Etch) (Applied Materials) moves with condition and availability. Our sourcing team will quote current pricing within 4 business hours.

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How much does a used 0200-40031 — Focus Ring, 300mm Silicon (DPS Etch) (Applied Materials) cost in 2026?

Pricing for used 0200-40031 — Focus Ring, 300mm Silicon (DPS Etch) (Applied Materials) units varies by condition and configuration. Contact us for current 2026 market pricing. Get a quote.

Used Applied Materials Parts & Consumables vs. buying new: is it worth it in 2026?

Used (2026)

✓Priced below new OEM

✓Inspected and functionally tested before shipment

✓30-day functional warranty

New OEM

—Full OEM list price

—Factory lead times apply

—New condition, full warranty

—Factory support included

Most buyers in 2026 choose used for cost and speed. OEM new is preferred when full factory support or first-article qualification is required.

What's included with a used 0200-40031 — Focus Ring, 300mm Silicon (DPS Etch) (Applied Materials) from Caladan Semi?

Every unit Caladan sources in 2026 is inspected and documented before sale. Here's what you get:

✓Functional test report and inspection photos
✓Available documentation (manuals, service records where available)
✓Availability: Available to Source — contact for current inventory
✓Export compliance documentation (EAR99 or ECCN classification provided)

0200-40031 Specifications and Compatible Tools

This 300mm silicon focus ring operates in 13.56MHz RF environments with 2,000W–4,000W forward power and <5% VSWR. It supports Cl₂/BCl₃/O₂ gas mixtures at 50–60sccm flow rates. Compatible tools include AMAT Centura DPS (1998–2005) and AMAT Centura DPS II (2003–2010). Do not use with 0200-40032 variants, which require different impedance matching networks. Verify the RF choke model (0200-40017A) for compatibility. DPS II systems require a 0200-40031B revision for high-density plasma modes. Always cross-check the etch chamber serial number to confirm DPS vs. DPS II configuration.

What to Check Before Buying a Used 0200-40031 in 2026

RF-hour count: Reject units >40,000 hours; silicon fatigue increases plasma leakage.
Surface inspection: Use a 10X loupe to check for cracks >0.2mm or delamination >5% surface area.
Impedance test: Measure with an LCR meter; Z must be 50–60Ω @ 13.56MHz.
Gas flow uniformity: Test with a mass flow controller; deviation >10% from 50sccm indicates erosion.
Plasma uniformity scan: Run a 300mm wafer profilometer test; >15% non-uniformity requires reprofiling.
Installation year: Units installed pre-2012 may lack the 0200-40031-RevC edge contour upgrade.

Q: Is 0200-40031 better than 0200-40032 for DPS Etch?
A: Yes. The 0200-40031 is designed for DPS systems, while 0200-40032 is for AMAT’s Indus platform. Mixing parts causes RF mismatch and arcing.

Q: Why is 0200-40031 pricing dropping in 2026?
A: OEM shift to 450mm tools and increased used inventory from decommissioned DPS lines.

Q: How long for delivery after purchase?
A: 2–4 weeks post-sourcing, pending RF testing and shipping logistics.

Q: Can I use this on a 200mm wafer system?
A: No. The 300mm design alters edge plasma coupling, causing defects. Use 0200-40029 for