TEL Trias CVD System

Name: TEL Trias CVD System
Brand: Tokyo Electron Limited (TEL)

Market Price

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Available by Request

Selling this part? Place an ask · Talk to a specialist · parts@caladansemi.com

✓Tested & inspected

✓Documentation included

✓Fast worldwide shipping

✓30-day functional warranty

✓Escrow payment available

Pricing

Price on request — quote in 4 hours

Market pricing for TEL Trias CVD System moves with condition and availability. Our sourcing team will quote current pricing within 4 business hours.

Get an exact quote →parts@caladansemi.com

How much does a used TEL Trias CVD System cost in 2026?

Pricing for used TEL Trias CVD System units varies by condition and configuration. Contact us for current 2026 market pricing. Get a quote.

Used Tokyo Electron Limited (TEL) Chemical Vapor Deposition (CVD) vs. buying new: is it worth it in 2026?

Used (2026)

✓Priced below new OEM

✓Inspected and functionally tested before shipment

✓30-day functional warranty

New OEM

—Full OEM list price

—Factory lead times apply

—New condition, full warranty

—Factory support included

Most buyers in 2026 choose used for cost and speed. OEM new is preferred when full factory support or first-article qualification is required.

What's included with a used TEL Trias CVD System from Caladan Semi?

Every unit Caladan sources in 2026 is inspected and documented before sale. Here's what you get:

✓Functional test report and inspection photos
✓Available documentation (manuals, service records where available)
✓Availability: Available to Source — contact for current inventory
✓Export compliance documentation (EAR99 or ECCN classification provided)

TEL Trias CVD System Specifications and Compatible Tools

Operates at 1–200 mTorr chamber pressure, 1–5 kW RF power (13.56 MHz), and 100–500 sccm gas flow rates. Deposits SiN/SiO₂ films at 5–50 nm/min with ±3% uniformity. Compatible with TEL P5000 (2008–2014), P7000 (2012–2017), and Hitachi HCP-5000 (2010–2015) cluster tools. Requires TEL’s proprietary ECR-3000 plasma source (PN: TEL-ECR-3000A). Exclusion: Incompatible with Lam Research Centura platforms without custom adapter kits (PN: TEL-ADP-TRIAS-LAM). Verify RF matching network compatibility for 2015+ Trias variants.

What to Check Before Buying a Used TEL Trias CVD System in 2026

Chamber wall erosion: Measure thickness via ultrasonic gauge; reject if <0.8mm below OEM spec (1.2mm nominal).
RF generator stability: Test output with oscilloscope; ±5% deviation from 13.56 MHz is acceptable.
Gas line integrity: Perform helium leak test; >1×10⁻⁶ mbar·L/s indicates seal failure.
Process cycle count: Cross-reference logs with PLC data; systems >12,000 cycles require pump refurbishment.
Heating element uniformity: Use thermocouple array; ±5°C variance across wafer is max.
Prioritize units with <8,000 cycles and documented 2021–2023 PM records to avoid costly upgrades.